SKU:67036040621
MgO (100) Epi polishing wafer 2" Dia x0.5mm, 1SP - MGa50D05C1US
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Ships within 48 hours · Estimated delivery Jul 13 - Jul 18
Description
MgO (100) Epi polishing wafer 2" Dia x0.5mm, 1SP - MGa50D05C1USSpecifications of MgO substrate Size: 2" diameter x 0. 5mm + _ 0. 05 mm Orientation: (100) + 0. 5 Deg Polish: One side EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): < 10A Packing: The substrate is packed with a 100 grade clean plastic bag under 1000 class cleanroom Precautions: MgO is sensitive to moisture, and must be stored in a vacuum box. Warning: MgO crystal was grown by arc melting method and natural
For making a small quantity of slurry
Carrier Concentration: (0
Crystal Purity
1 mol/L LiTFSI
(installed in Aluminum plate) 2 set UP820-04 8" dia x 0
9 pm/V rT 33 =112
This wafer container is designed for 6" diameter wafers
It can be pressed tightly by two layers of high-elastic film and suspended in the middle of the carrier
Atomic Number 13
Diameter: 50mm
A plane (11-20) sapphire wafer is being used extensively as a substrate for III-V nitrides and magnetic epitaxial films due to its better lattice mismatch
Carrier concentration: <1012/cm 3
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Your MgO (100) Epi polishing wafer 2" Dia x0.5mm, 1SP - MGa50D05C1US orders ship within 1-2 business days.
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